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Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition Ni₈₀Fe₂₀ nanotubes with optimized spintronic functionalities prepared by atomic layer deposition On the Contact Optimization of ALD-Based MoS₂ FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance

Search 1609 plasma ALD publications by:

202 Films Compositions

272 Precursors and Plasma Gases

76 Deposition Hardwares

249 Film and Plasma Characteristics

The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism

Type:

Journal

Info:

Journal of Power Sources Volume 280, 15 April 2015, Pages 166-172

Date:

2015-01-13

DOI:

http://dx.doi.org/10.1016/j.jpowsour.2015.01.081

Author Information

Name	Institution
Chao-Cheng Ting	National Chiao Tung University
Chung-Hsuan Liu	National Chiao Tung University
Chun-Yen Tai	National Chiao Tung University
Shih-Chieh Hsu	National Chiao Tung University
Chih-Shuan Chao	National Chiao Tung University
Fu-Ming Pan	National Chiao Tung University

Films

Plasma Pt

Hardware used: Custom

(Trimethyl)methylcyclopentadienylplatinum, MeCpMe₃Pt

CAS#: 94442-22-5

Where to buy precursor

O₂, Oxygen

CAS#: 7782-44-7

Deposition Temperature = 200C

Film/Plasma Properties

Substrates

TiO₂

Keywords

Notes

328

The publication database currently has 1609 entries.

Search from:

202 Films Compositions

272 Precursors and Plasma Gases

76 Deposition Hardwares

249 Film and Plasma Characteristics

86 Theses