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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
Type:
Journal
Info:
Journal of Power Sources Volume 280, 15 April 2015, Pages 166-172
Date:
2015-01-13
Author Information
| Name | Institution |
|---|---|
| Chao-Cheng Ting | National Chiao Tung University |
| Chung-Hsuan Liu | National Chiao Tung University |
| Chun-Yen Tai | National Chiao Tung University |
| Shih-Chieh Hsu | National Chiao Tung University |
| Chih-Shuan Chao | National Chiao Tung University |
| Fu-Ming Pan | National Chiao Tung University |
Films
Film/Plasma Properties
Substrates
| TiO2 |
Keywords
Notes
| 328 |