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Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
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Publication Information
Title:
The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
Type:
Journal
Info:
Journal of Power Sources Volume 280, 15 April 2015, Pages 166-172
Date:
2015-01-13
Author Information
| Name | Institution |
|---|---|
| Chao-Cheng Ting | National Chiao Tung University |
| Chung-Hsuan Liu | National Chiao Tung University |
| Chun-Yen Tai | National Chiao Tung University |
| Shih-Chieh Hsu | National Chiao Tung University |
| Chih-Shuan Chao | National Chiao Tung University |
| Fu-Ming Pan | National Chiao Tung University |
Films
Film/Plasma Properties
Substrates
| TiO2 |
Keywords
Notes
| 328 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |