Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
Info:
Ceramics International 46 (2020) 10121-10129
Author Information
Films
Film/Plasma Properties
Analysis: SEM, Scanning Electron Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: AFM, Atomic Force Microscopy
Analysis: XRD, X-Ray Diffraction
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: Transistor Characterization
Substrates
Notes