Bis(dimethylamino) [(methylaminodimethylsilyl) methylcyclopentadienyl] hafnium(IV), (DNSHf, Hf[η5:η1-Cp(CH2 ) (SiMe2)NMe](NMe2)2, CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
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1 | Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor |