Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Bis(dimethylamino) [(methylaminodimethylsilyl) methylcyclopentadienyl] hafnium(IV), (DNSHf, Hf[η5:η1-Cp(CH2 ) (SiMe2)NMe](NMe2)2, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor