Publication Information

Title: Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)

Type: Conference Proceedings

Info: Mat. Res. Soc. Symp. Proc. Vol. 685E

Date: 2001-01-01

DOI: http://dx.doi.org/10.1557/PROC-685-D13.3.1

Author Information

Name

Institution

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Chungnam National University

Genitech Co., Ltd.

Films

Plasma SrTa2O6 using Custom

Deposition Temperature = 300C

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Unknown

Anneal

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

SEM, Scanning Electron Microscopy

-

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

HP 4275A LCR

Dissipation Factors

C-V, Capacitance-Voltage Measurements

HP 4275A LCR

Leakage Current

I-V, Current-Voltage Measurements

HP 4145B Semiconductor Parameter Analyzer

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

-

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

-

Substrates

Pt

Keywords

Notes

8A per cycle, perhaps CVD component

23



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