Publication Information

Title:
Plasma enhanced atomic layer deposition of Fe2O3 thin films
Type:
Journal
Info:
J. Mater. Chem. A, 2014,2, 10662-10667
Date:
2014-05-19

Author Information

Name Institution
Ranjith K. RamachandranGhent University

Films

Plasma Fe2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Silicon

Keywords

PEALD Film Development

Notes

PEALD Fe2O3 film development.
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