Publication Information

Title:
A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
Type:
Conference Proceedings
Info:
ECS Transactions, 11 (7) 55-60 (2007)
Date:
2007-07-01

Author Information

Name Institution
Toshio AndoHitachi, Ltd.
Yosuke OhtaHitachi, Ltd.
Hiroshi AshiharaHitachi, Ltd.
Toshinori ImaiHitachi, Ltd.

Films

Plasma SiNx


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Capacitance
Analysis: C-F, Capacitance-Frequency Meaurements

Characteristic: Loss Tangent
Analysis: C-F, Capacitance-Frequency Meaurements

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Substrates

TiN

Keywords

Notes

1172