DCS, H2SiCl2, DiChloroSilane, CAS# 4109-96-0

Where to buy

NumberVendorRegionLink
1Yoodatech (Shanghai) Co., LtdDCS, H2SiCl2, DiChloroSilane - contact maggie@yoodatech.com
2Pegasus Chemicals🇬🇧Dichlorosilane
3Gelest🇺🇸Dichlorosilane

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
2Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
3Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
4Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
5Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
6Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
7Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
8Challenges in spacer process development for leading-edge high-k metal gate technology
9Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
10Atomic layer epitaxy of Si using atomic H