DCS, H2SiCl2, DiChloroSilane, CAS# 4109-96-0

Where to buy

NumberVendorRegionLink
1Yoodatech (Shanghai) Co., LtdDCS, H2SiCl2, DiChloroSilane - contact maggie@yoodatech.com
2Gelest🇺🇸Dichlorosilane
3Pegasus Chemicals🇬🇧Dichlorosilane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
2Challenges in spacer process development for leading-edge high-k metal gate technology
3Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
4Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
5A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
6Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
7Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
8Atomic layer epitaxy of Si using atomic H
9Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
10Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition