DCS, H2SiCl2, DiChloroSilane, CAS# 4109-96-0

Where to buy

NumberVendorRegionLink
1Pegasus Chemicals🇬🇧Dichlorosilane
2Gelest🇺🇸Dichlorosilane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
2Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
3Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
4Challenges in spacer process development for leading-edge high-k metal gate technology
5Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
6A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
7Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
8Atomic layer epitaxy of Si using atomic H
9Evaluation of Stress Induced by Plasma Assisted ALD SiN Film