Atomic layer controlled deposition of silicon nitride with self-limiting mechanism

Type:
Journal
Info:
Appl. Phys. Lett. 68, 3257 (1996)
Date:
1996-03-28

Author Information

Name Institution
Hiroshi GotoHiroshima University
Kentaro ShibaharaHiroshima University
Shin YokoyamaHiroshima University

Films

Plasma SiNx


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Unknown

Notes

73