Your search for plasma enhanced atomic layer deposition publications using ASM Eagle XP8 hardware returned 4 records. If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Combined PEALD Gate-Dielectric and In-Situ SiN Cap-Layer for Reduced Vth Shift and RDS-ON Dispersion of AlGaN/GaN HEMTs on 200 mm Si Wafer|
|2||Combined plasma-enhanced-atomic-layer-deposition gate dielectric and in situ SiN cap layer for reduced threshold voltage shift and dynamic ON-resistance dispersion of AlGaN/GaN high electron mobility transistors on 200 mm Si substrates|
|3||Designing high performance precursors for atomic layer deposition of silicon oxide|
|4||Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control|
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