Publication Information

Title:
Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(3), May/Jun 2014
Date:
2014-04-02

Author Information

Name Institution
Ki-Moon JeonKorea Research Institute of Standards and Science (KRISS)

Films

Plasma SiO2


Film/Plasma Properties

Substrates

Keywords

Notes

221