Publication Information

Title: Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)

Type: Journal

Info: Proc. SPIE 7520, Lithography Asia 2009

Date: 2009-12-09

DOI: http://dx.doi.org/10.1117/12.836979

Author Information

Name

Institution

ASM Microchemistry Oy

IMEC

IMEC

IMEC

IMEC

ASM Microchemistry Oy

IMEC

ASM Microchemistry Oy

IMEC

ASM Microchemistry Oy

ASM Microchemistry Oy

IMEC

Films

Plasma SiO2 using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

-

Images

SEM, Scanning Electron Microscopy

-

Substrates

Photoresist

Keywords

Double Patterning

Notes

747



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