Publication Information

Title:
Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
Type:
Journal
Info:
Proc. SPIE 7520, Lithography Asia 2009
Date:
2009-12-09

Author Information

Name Institution
Julien BeynetASM Microchemistry Oy
Patrick WongIMEC
Andy MillerIMEC
Sabrina LocorotondoIMEC
Diziana VangoidsenhovenIMEC
Tae-Ho YoonASM Microchemistry Oy
Marc DemandIMEC
Hyung-Sang ParkASM Microchemistry Oy
Tom VandeweyerIMEC
Hessel SpreyASM Microchemistry Oy
Yong-Min YooASM Microchemistry Oy
Mireille MaenhoudtIMEC

Films

Plasma SiO2

Hardware used: Unknown


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Photoresist

Keywords

Double Patterning

Notes

747