Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)

Type:
Journal
Info:
Proc. SPIE 7520, Lithography Asia 2009
Date:
2009-12-09
DOI:
http://dx.doi.org/10.1117/12.836979

Author Information

Name Institution
Julien BeynetASM Microchemistry Oy
Patrick WongIMEC
Andy MillerIMEC
Sabrina LocorotondoIMEC
Diziana VangoidsenhovenIMEC
Tae-Ho YoonASM Microchemistry Oy
Marc DemandIMEC
Hyung-Sang ParkASM Microchemistry Oy
Tom VandeweyerIMEC
Hessel SpreyASM Microchemistry Oy
Yong-Min YooASM Microchemistry Oy
Mireille MaenhoudtIMEC

Films

Plasma SiO2

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

Photoresist

Notes

747