Search 1556 plasma ALD publications by:
Search 1556 plasma ALD publications by:
Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
Type:
Conference Proceedings
Info:
2015 Annual Meeting of the APS Four Corners Section
Date:
2015-10-16
Author Information
Name | Institution |
---|---|
Mei Hao | Arizona State University |
Films
Film/Plasma Properties
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Unknown
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
GaN |
Keywords
Notes
490 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |