Publication Information

Title: Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN

Type: Conference Proceedings

Info: 2015 Annual Meeting of the APS Four Corners Section

Date: 2015-10-16

DOI: http://meetings.aps.org/Meeting/4CF15/Session/D6.2

Author Information

Name

Institution

Arizona State University

Films

Plasma Al2O3 using Unknown

Deposition Temperature Range N/A

Plasma SiO2 using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Breakdown Voltage

I-V, Current-Voltage Measurements

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Unknown

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

GaN

Keywords

Notes

490



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