Publication Information

Title:
Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
Type:
Conference Proceedings
Info:
2015 Annual Meeting of the APS Four Corners Section
Date:
2015-10-16

Author Information

Name Institution
Mei HaoArizona State University

Films

Plasma Al2O3

Hardware used: Unknown


Plasma SiO2

Hardware used: Unknown


Film/Plasma Properties

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Unknown
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

GaN

Keywords

Notes

490