Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Via sidewall insulation for through cell via contacts

Type:
Conference Proceedings
Info:
13th International Conference on Concentrator Photovoltaic Systems (CPV-13)
Date:
2017-09-06

Author Information

Name Institution
Mathieu de LafontaineUniversity of Sherbrooke
Abdelatif JaouadUniversity of Sherbrooke
Maxine DarnonUniversity of Sherbrooke
Maïté VolatierUniversity of Sherbrooke
Richard ArèsUniversity of Sherbrooke
Simon FafardUniversity of Sherbrooke
Vincent AimezUniversity of Sherbrooke

Films

Plasma SiO2

Hardware used: Unknown


Film/Plasma Properties

Substrates

InGaAs
InGaP
Ge

Notes

1148