Publication Information

Title: Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C

Type: Journal

Info: Japanese Journal of Applied Physics 53, 010305 (2014)

Date: 2013-11-24

DOI: http://dx.doi.org/10.7567/JJAP.53.010305

Author Information

Name

Institution

Nagoya University

ASM Microchemistry Oy

Nagoya University

Nagoya University

Nagoya University

Nagoya University

Films

Plasma SiO2 using Unknown

Deposition Temperature = 50C

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Deposition Kinetics, Reaction Mechanism

ATR-FTIR

Unknown

Substrates

Keywords

Notes

Precursor identified as aminosilane in abstract but that is more of a class of precursors than a specific molecule.

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