Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films

Type:
Conference Proceedings
Info:
2016 IEEE SENSORS
Date:
2016-10-30
DOI:
http://dx.doi.org/10.1109/ICSENS.2016.7808461

Author Information

Name Institution
Choongsoon KimGeorgia Institute of Technology
Spyridon PavlidisGeorgia Institute of Technology
Min-gu KimGeorgia Institute of Technology
Oliver BrandGeorgia Institute of Technology
Hang ChenGeorgia Institute of Technology

Films

Plasma SiO2

Hardware used: Unknown
Deposition Temperature = 250C

Film/Plasma Properties

Substrates

Notes

966