Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2014, 6 (13), pp 10534-1054
Date:
2014-06-10
Author Information
| Name | Institution |
|---|---|
| Ciaran A. Murray | Tyndall National Institute, University College Cork |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Substrates
Notes
| 247 |