Publication Information

Title:
Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2014, 6 (13), pp 10534-1054
Date:
2014-06-10

Author Information

Name Institution
Ciaran A. MurrayTyndall National Institute, University College Cork

Films

Plasma SiO2

Hardware used: Unknown


Plasma SiNx

Hardware used: Unknown


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

Keywords

Density Functional Theory (DFT)
Modeling

Notes

247