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Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2

Type:
Journal
Info:
Chem. Commun., 2015, 51, 1341-1344
Date:
2014-12-01
DOI:
http://dx.doi.org/10.1039/C4CC08004A

Author Information

Name Institution
Guo-Yong FangNanjing University

Films

Plasma SiO2

Hardware used: Unknown
Bis(DiMethylAmido)Silane, (Me2N)2SiH2, BDMAS
CAS#: 0-0-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

Density Functional Theory (DFT) of SiO2 PEALD with aminosilanes.
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