The publication database currently has 1636 entries.
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
91 Theses
5041 Authors
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Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
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Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
Type:
Journal
Info:
Chem. Commun., 2015, 51, 1341-1344
Date:
2014-12-01
Author Information
| Name | Institution |
|---|---|
| Guo-Yong Fang | Nanjing University |
Films
Film/Plasma Properties
Substrates
Keywords
| Density Functional Theory (DFT) |
Notes
| Density Functional Theory (DFT) of SiO2 PEALD with aminosilanes. |
| 285 |