Publication Information

Title:
Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
Type:
Conference Proceedings
Info:
2015 SID Symposium Digest of Technical Papers
Date:
2015-09-22

Author Information

Name Institution
Jong Bum KoKorea Advanced Institute of Science and Technology
Hye In YeomKorea Advanced Institute of Science and Technology
Chi Sun HwangElectronics and Telecommunication Research Institute, (ETRI)
Sung Haeng ChoElectronics and Telecommunication Research Institute, (ETRI)
Sang-Hee Ko ParkKorea Advanced Institute of Science and Technology

Films

Plasma SiO2

Hardware used: Unknown


Film/Plasma Properties

Substrates

Keywords

Notes

461