Publication Information

Title: Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses

Type: Journal

Info: Microelectronic Engineering 191 (2018) 91 - 96

Date: 2018-01-30

DOI: https://doi.org/10.1016/j.mee.2018.01.033

Author Information

Name

Institution

Paul Scherrer Institut

Paul Scherrer Institut

Paul Scherrer Institut

Paul Scherrer Institut

Paul Scherrer Institut

Paul Scherrer Institut

Friedrich-Alexander University Erlangen-Nuremberg

Friedrich-Alexander University Erlangen-Nuremberg

Friedrich-Alexander University Erlangen-Nuremberg

Synchrotron SOLEIL

Synchrotron SOLEIL

Synchrotron SOLEIL

Paul Scherrer Institut

Paul Scherrer Institut

Paul Scherrer Institut

Films

Plasma Ir using Picosun R200

Deposition Temperature = 370C

15635-87-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

HSQ, Hydrogen SilsesQuioxane

Si3N4

Keywords

Double Patterning

Notes

1230



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