Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates

Type:
Journal
Info:
J. Synchrotron Rad. (2020). 27
Date:
2020-02-07
DOI:
http://dx.doi.org/2020-02-07

Author Information

Name Institution
Viktoria YurgensPaul Scherrer Institut
Frieder KochPaul Scherrer Institut
Mario ScheelSynchrotron SOLEIL
Timm WeitkampSynchrotron SOLEIL
Christian DavidPaul Scherrer Institut

Films

Plasma Ir

Hardware used: Picosun R200
Ir(acac)3, Iridium acetylacetonate, Iridium pentanedione
CAS#: 15635-87-7
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 370C

Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

Si3N4
HSQ, Hydrogen SilsesQuioxane

Notes

Deposition details assumed from Marschall reference.
1465