Publication Information

Title: High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds

Type: Journal

Info: Journal of Vacuum Science & Technology B 34, 061804 (2016)

Date: 2016-10-28

DOI: http://dx.doi.org/10.1116/1.4967696

Author Information

Name

Institution

A*STAR (Agency for Science, Technology and Research)

A*STAR (Agency for Science, Technology and Research)

A*STAR (Agency for Science, Technology and Research)

Eulitha AG

Eulitha AG

Eulitha AG

Eulitha AG

Paul Scherrer Institut

Paul Scherrer Institut

microSWISS AG

Films

Plasma Ir using Picosun R200

Deposition Temperature = 370C

15635-87-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

-

Substrates

Silicon

Keywords

Imprint Lithography

Notes

860



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