Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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M. G. Kozodaev Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by M. G. Kozodaev returned 2 record(s).

NumberTitle
1Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
2Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks