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Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition

Type:
Journal
Info:
Organic Electronics, Volume 52, 2018, Pages 98 - 102
Date:
2017-10-05
DOI:
https://doi.org/10.1016/j.orgel.2017.10.004

Author Information

Name Institution
Hyun Gi KimKyung Hee University
Jong Geol LeeKyung Hee University
Sung Soo KimKyung Hee University

Films

Plasma Al2O3

Hardware used: Custom Direct Capacitively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)
Diagnostic: Mocon Aquatron Model 2

Characteristic: Wetting Angle
Analysis: Contact Angle Measurement
Diagnostic: SEO Ltd., Phoenix 300

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2100F

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: Oxford Instruments INCA X-Sight

Characteristic: Flexibility
Analysis: Bending Test, Four Point Bend Delamination Test
Diagnostic: YUASA TCDM-111 U-Folding test system

Characteristic: UV-Vis Transmission
Analysis: Optical Transmission
Diagnostic: Otsuka MCPD-3000

Substrates

PEN, Polyethylene Napthalate
Ag

Notes

1128