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ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"

Type:
Journal
Info:
Phys. Status Solidi A 2019, 1900256
Date:
2019-07-02
DOI:
https://doi.org/10.1002/pssa.201900256

Author Information

Name Institution
Julian PilzGraz University of Technology
Alberto PerrottaGraz University of Technology
Günther LeisingGraz University of Technology
Anna Maria CocliteGraz University of Technology

Films

Plasma ZnO

Hardware used: Custom Direct Capacitively Coupled Plasma
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 25-250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Absorption Edges
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-1800

Characteristic: Absorption Edges
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-1800

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Empyrean

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Jandel

Substrates

Si(100)
Quartz
Glass

Notes

1527