ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
Type:
Journal
Info:
Phys. Status Solidi A 2019, 1900256
Date:
2019-07-02
Author Information
| Name | Institution |
|---|---|
| Julian Pilz | Graz University of Technology |
| Alberto Perrotta | Graz University of Technology |
| Günther Leising | Graz University of Technology |
| Anna Maria Coclite | Graz University of Technology |
Films
Plasma ZnO
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Absorption Edges
Analysis: Ellipsometry
Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Characteristic: Absorption Edges
Analysis: UV-VIS Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Substrates
| Si(100) |
| Quartz |
| Glass |
Notes
| 1527 |