ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
Type:
Journal
Info:
Japanese Journal of Applied Physics 50 (2011) 04DF05
Date:
2010-12-15
Author Information
| Name | Institution |
|---|---|
| Yumi Kawamura | Nara Institute of Science and Technology |
| Nozomu Hattori | Mitsui Engineering & Shipbuilding Co., Ltd. |
| Naomasa Miyatake | Mitsui Engineering & Shipbuilding Co., Ltd. |
| Masahiro Horita | Nara Institute of Science and Technology |
| Yukiharu Uraoka | CREST, Japan Science and Technology Agency |
Films
Plasma ZnO
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Compositional Depth Profiling
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Substrates
| Silicon |
Notes
| 1361 |