Inductively coupled plasma sources from Plasma ALD, LLC.


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Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors

Type:
Journal
Info:
Nanoscale 2015, Volume 110, Issue , pp 59 - 64
Date:
2015-03-30
DOI:
http://dx.doi.org/10.1016/j.sse.2015.01.013

Author Information

Name Institution
Jörg SchulzeUniversitat Stuttgart
Andreas BlechUniversitat Stuttgart
Arnab DattaUniversitat Stuttgart
Inga Anita FischerUniversitat Stuttgart
D. HaehnelUniversitat Stuttgart
Sandra NaaszUniversitat Stuttgart
Erlend RolsethUniversitat Stuttgart
Eva-Maria TropperUniversitat Stuttgart

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

554