Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Jörg Schulze Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jörg Schulze returned 2 record(s).

NumberTitle
1Device performance tuning of Ge gate-all-around tunneling field effect transistors by means of GeSn: Potential and challenges
2Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors