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Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2016, 8 (21), pp 13590-13600
Date:
2016-05-11
DOI:
http://dx.doi.org/10.1021/acsami.6b02292

Author Information

Name Institution
Mehr Negar MirvakiliUniversity of British Columbia
Hao Van BuiDelft University of Technology
J. Ruud van OmmenDelft University of Technology
Savvas G. HatzikiriakosUniversity of British Columbia
Peter EnglezosUniversity of British Columbia

Films

Plasma Al2O3

Hardware used: Oxford Instruments FlexAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Wetting Angle
Analysis: -
Diagnostic: -

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Cup Method
Diagnostic: -

Characteristic: Water Vapor Permeability (WVP)
Analysis: Cup Method
Diagnostic: -

Characteristic: Air Permeability
Analysis: Gurley Method
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: Profilometry
Diagnostic: Wyko NT1100 Optical profilometer

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi S-3000N-VP

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi S-3000N-VP

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Leybold MAX200

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: Thermo Nicolet AVATAAR 360

Substrates

Paper
Silicon

Notes

787