Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

J. Ruud van Ommen Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by J. Ruud van Ommen returned 2 record(s).

NumberTitle
1Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
2Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films