Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime

Type:
Journal
Info:
Nano Lett., 2015, 15 (10), pp 6683-6688
Date:
2015-09-06
DOI:
http://dx.doi.org/10.1021/acs.nanolett.5b02505

Author Information

Name Institution
Joon-Yeon KimSeoul National University
Bong Joo KangAjou University
Joohyun ParkHanyang University
Young-Mi BahkSeoul National University
Won Tae KimAjou University
Jiyeah RhieSeoul National University
Hyeongtag JeonHanyang University
Fabian RotermundAjou University
Dai-Sik KimSeoul National University

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Substrates

Quartz
Au
Ag

Notes

541