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Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition

Type:
Journal
Info:
JOURNAL OF APPLIED PHYSICS 115, 073502 (2014)
Date:
2014-02-05

Author Information

Name Institution
Hyunsoo JungHanyang University

Films

Plasma Al2O3


Film/Plasma Properties

Substrates

Notes

201