Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
Info:
Journal of The Electrochemical Society, 158 (1) H21-H24 (2011)
Author Information
Films
Film/Plasma Properties
Analysis: TEM, Transmission Electron Microscope
Analysis: TEM, Transmission Electron Microscope
Analysis: OES, Optical Emission Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Substrates
Notes