Sanghyun Woo Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Sanghyun Woo returned 10 record(s).

Number	Title
1	Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO₂ Thin Films
2	Atomic Layer Deposition of HfO₂ Thin Films on Ultrathin SiO₂ Formed by Remote Plasma Oxidation
3	The Effects of Annealing Ambient on the Characteristics of La₂O₃ Films Deposited by RPALD
4	Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO₂/SiO₂/Si and HfO₂/SiO_xN_y/Si Stack Structures Formed by Remote Plasma Technique
5	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO₂ for Nonvolatile Memory Devices
6	Effect of Buffer Layer for HfO₂ Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
7	Atomic layer deposited HfO₂/HfSi_xO_yN_z stacked gate dielectrics for metal-oxide-semiconductor structures
8	Characteristics of Atomic-Layer-Deposited HfO₂ Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
9	Effects of an Al₂O₃ capping layer on La₂O₃ deposited by remote plasma atomic layer deposition
10	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N₂ and N₂O Plasma Post-Treatments