Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Hyerin Lee Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hyerin Lee returned 3 record(s).

NumberTitle
1Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
2The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
3Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films