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Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study

Type:
Journal
Info:
Applied Surface Science 483 (2019) 10 - 18
Date:
2019-03-19
DOI:
https://doi.org/10.1016/j.apsusc.2019.03.122

Author Information

Name Institution
Alberto PerrottaGraz University of Technology
Julian PilzGraz University of Technology
Antonella MilellaUniversità degli studi di Bari
Anna Maria CocliteGraz University of Technology

Films

Plasma ZnO

Hardware used: Custom Direct Capacitively Coupled Plasma
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 25-250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Band Gap
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Unknown
Analysis: Temperature Dependent Spectroscopic Ellipsometry
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Characteristic: Unknown
Analysis: Temperature Dependent X-Ray Diffraction
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: PHI VersaProbe 5000

Characteristic: Optical Absorption
Analysis: UV-VIS Spectroscopy
Diagnostic: -

Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy
Diagnostic: -

Substrates

Si(100)

Notes

1270