Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits

Type:
Journal
Info:
Scientific Reports 7, Article number: 1368 (2017)
Date:
2017-01-10
DOI:
http://dx.doi.org/10.1038/s41598-017-01012-y

Author Information

Name Institution
Tsung-Ta WuNational Nano Device Labs
Wen-Hsien HuangNational Nano Device Labs
Chih-Chao YangNational Nano Device Labs
Hung-Chun ChenNational Nano Device Labs
Tung-Ying HsiehNational Nano Device Labs
Wei-Sheng LinNational Tsing Hua University
Ming-Hsuan KaoNational Chiao Tung University
Chiu-Hao ChenNational Nano Device Labs
Jie-Yi YaoNational Nano Device Labs
Yi-Ling JianNational Nano Device Labs
Chiung-Chih HsuNational Nano Device Labs
Kun-Lin LinNational Nano Device Labs
Chang-Hong ShenNational Nano Device Labs
Yu-Lun ChuehNational Tsing Hua University
Jia-Ming ShiehNational Nano Device Labs

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

1086