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Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum

Type:
Journal
Info:
Chem. Mater., 2012, 24 (10), pp 1752-1761
Date:
2012-04-17
DOI:
http://dx.doi.org/10.1021/cm203812v

Author Information

Name Institution
Adriaan J. M. MackusEindhoven University of Technology
Noémi LeickEindhoven University of Technology
Layton BakerUniversity of Colorado, Boulder
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Pt

Hardware used: Custom
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000U

Substrates

Notes

Strong Pt ALD literature review.
Paper exists as chapter 3 in thesis downloadable at http://alexandria.tue.nl/extra2/754694.pdf
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