About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Applied Optics, Vol. 59, No. 5, 2020
Date:
2019-10-31
DOI:
http://dx.doi.org/10.1364/AO.59.000A16

Author Information

Name Institution
Eric DickeyLotus Applied Technology
Kalle NiiranenBeneq Oy
Bryan DanforthLotus Applied Technology
William A. BarrowLotus Applied Technology

Films

Plasma Nb2O5

Hardware used: Custom Spatial
Nb(N-tBu)(NMeEt)3, TBTMEN
CAS#: 864150-47-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 180C

Plasma SiO2

Hardware used: Custom Spatial
BDIPADS, 1,2-Bis(diisopropylamino)disilane
CAS#: 151625-26-2
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 180C

Film/Plasma Properties

Characteristic: Transmittance
Analysis: -
Diagnostic: -

Characteristic: Uniformity
Analysis: Optical Reflectivity
Diagnostic: Ocean Optics Flame

Substrates

SiO2

Notes

1522