Nb(N-^tBu)(NMeEt)₃, TBTMEN, CAS# 864150-47-0

Your search for publications using this chemistry returned 4 record(s).

Number	Title
1	Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
2	Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO₂ gate stacks
3	Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
4	Plasma-enhanced ALD system for SRF cavity

Nb(N-tBu)(NMeEt)3, TBTMEN, CAS# 864150-47-0