About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers

Type:
Journal
Info:
2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC)
Date:
2016-06-05

Author Information

Name Institution
S. JanzFraunhofer Institute for Solar Energy Systems (ISE)
M. FeifelFraunhofer Institute for Solar Energy Systems (ISE)
J. OhlmannFraunhofer Institute for Solar Energy Systems (ISE)
J. BenickFraunhofer Institute for Solar Energy Systems (ISE)
C. WeissFraunhofer Institute for Solar Energy Systems (ISE)
M. HermleFraunhofer Institute for Solar Energy Systems (ISE)
A. W. BettFraunhofer Institute for Solar Energy Systems (ISE)
F. DimrothFraunhofer Institute for Solar Energy Systems (ISE)
D. LacknerFraunhofer Institute for Solar Energy Systems (ISE)

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Minority Carrier Lifetime
Analysis: QSSPC, Quasi-Steady-State PhotoConductance Decay

Substrates

Silicon

Notes

951