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Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions

Type:
Journal
Info:
Micron, Volume 74, 2015, Pages 8 - 14
Date:
2015-03-30
DOI:
http://dx.doi.org/10.1016/j.micron.2015.03.012

Author Information

Name Institution
M. KawasakiJEOL USA Inc.
C.N. HsiaoNational Applied Research Laboratories
Jer-Ren YangNational Taiwan University
Makoto ShiojiriKyoto Institute of Technology

Films

Plasma Ru

Hardware used: Custom
Bis(cyclopentadienyl)ruthenium, Ruthenocene, Cp2Ru, (C5H5)2Ru
CAS#: 1287-13-4
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Plasma Ru

Hardware used: Custom
Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2
CAS#: 32992-96-4
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Plasma Pt

Hardware used: Custom
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: JEOL JEM ARM 200

Substrates

Silicon
Amorphous C

Notes

534