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Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A109 (2018)
Date:
2017-11-06
DOI:
http://dx.doi.org/10.1116/1.5003334

Author Information

Name Institution
Julian PilzGraz University of Technology
Alberto PerrottaGraz University of Technology
Paul ChristianGraz University of Technology
Martin TazreiterGraz University of Technology
Roland ReselGraz University of Technology
Günther LeisingGraz University of Technology
Thomas GriesserUniversity of Leoben
Anna Maria CocliteGraz University of Technology

Films

Plasma ZnO

Hardware used: Custom Direct Capacitively Coupled Plasma
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 25C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000V

Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-1800

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Substrates

Si(100)

Notes

1413