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Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8

Type:
Journal
Info:
Crystals 2022, 12, 217
Date:
2022-01-28
DOI:
http://dx.doi.org/10.3390/cryst12020217

Author Information

Name Institution
Marianne KräuterGraz University of Technology
Alexander John CruzKU Leuven
Timothée StassinKU Leuven
Sabina Rodrí­guez-HermidaKU Leuven
Rob AmelootKU Leuven
Roland ReselGraz University of Technology
Anna Maria CocliteGraz University of Technology

Films

Plasma ZnO

Hardware used: Custom Direct Capacitively Coupled Plasma
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 25C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: -

Substrates

Si(100)

Notes

1709