About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2016, 8 (13), pp 8393-8400
Date:
2016-03-14
DOI:
http://dx.doi.org/10.1021/acsami.6b01417

Author Information

Name Institution
Chaowen XueNanchang University
Xiaotong ShiNanchang University
Xuan FangChangchun University of Science and Technology
Haiyan TaoChangchun University of Science and Technology
Hui ZhuChinese Academy of Sciences
Fen YuNanchang University
Xingwei DingNanchang University
Miaoxing LiuNanchang University
Fang FangNanchang University
Fan YangChinese Academy of Sciences
Zhipeng WeiChangchun University of Science and Technology
Tingtao ChenNanchang University
Zongliang WangChinese Academy of Sciences
Guoping WangWuhan University
Xigao ChengNanchang University
Junchao WeiNanchang University
Yingjie LinJeatech Company for 3D Scanning
Keyu DengNanchang University
Xiaolei WangNanchang University
Hongbo XinNanchang University

Films

Plasma ZnO

Hardware used: Ensure LabNano PE
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 150C

Film/Plasma Properties

Substrates

PLA, PolyLactic Acid

Notes

810