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Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes

Type:
Journal
Info:
Scientific Reports 7, Article number: 40061 (2016)
Date:
2016-11-30
DOI:
http://dx.doi.org/10.1038/srep40061

Author Information

Name Institution
Zheng ChenJilin University
Haoran WangJilin University
Xiao WangJilin University
Ping ChenJilin University
Yunfei LiuJilin University
Hongyu ZhaoJilin University
Yi ZhaoJilin University
Yu DuanJilin University

Films

Plasma ZrO2

Hardware used: Kemicro PEALD-150
TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide
CAS#: 19756-04-8
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 80C

Thermal Zircone

Hardware used: Kemicro PEALD-150
TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide
CAS#: 19756-04-8
Ethylene glycol
CAS#: 107-21-1
Deposition Temperature = 80C

Film/Plasma Properties

Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance
Diagnostic: -

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Diagnostic: -

Substrates

PET, Polyethylene Terephthalate
Zircone
Silicon

Notes

876