First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
Type:
Journal
Info:
Phys. Chem. Chem. Phys., 2018, 20, 22783-22795
Date:
2018-08-17
Author Information
| Name | Institution |
|---|---|
| Glen N. Fomengia | Tyndall National Institute, University College Cork |
| M. G. Nolan | Tyndall National Institute, University College Cork |
| Simon D. Elliott | Schrödinger |
Films
Plasma Al2O3
Film/Plasma Properties
Substrates
Notes
| 1280 |