Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD

Type:
Journal
Info:
Journal of Physics: Conference Series 1243 (may) 012002
Date:
2019-01-01

Author Information

Name Institution
F ZoubianUniversity of Orléans - CNRS
H RabatUniversity of Orléans - CNRS
O AubryUniversity of Orléans - CNRS
N DumuisUniversity of Orléans - CNRS
S DoziasUniversity of Orléans - CNRS
D MuñozrojasGrenoble Alps University (UGA)
D HongUniversity of Orléans - CNRS

Films

Hardware used: FHR-150-ALD

CAS#: 7782-44-7

Film/Plasma Properties

Characteristic: Plasma Species
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Images
Analysis: Micro Discharge Imaging

Substrates

Notes

Custom Dielectric Barrier Discharge (DBD) characterization for spatial, atmospheric pressure plasma ALD system.
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