Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

FHR-150-ALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using FHR-150-ALD hardware returned 2 records.

NumberTitle
1Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
2Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD