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Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma

Type:
Journal
Info:
Applied Surface Science 357, Part A (2015) 672 - 677
Date:
2015-09-06
DOI:
http://dx.doi.org/10.1016/j.apsusc.2015.09.062

Author Information

Name Institution
Jeong Hwan HanKorea Research Institute of Chemical Technology
Byoung Kook LeeKorea Research Institute of Chemical Technology
Eun Ae JungKorea Research Institute of Chemical Technology
Hyo-Suk KimKorea Research Institute of Chemical Technology
Seong Jun KimKorea Research Institute of Chemical Technology
Chang Gyoun KimKorea Research Institute of Chemical Technology
Taek-Mo ChungKorea Research Institute of Chemical Technology
Ki-Seok AnKorea Research Institute of Chemical Technology

Films

Plasma ZnSnO

Hardware used: Unknown
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
Sn(dmamp)2, bis(1-dimethylamino-2-methyl-2-propoxide)Sn
CAS#: 0-0-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 100-200C

Plasma ZnO

Hardware used: Unknown
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 100-200C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: -
Diagnostic: -

Characteristic: Conformality, Step Coverage
Analysis: -
Diagnostic: -

Substrates

Notes

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