About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD

Type:
Journal
Info:
IEEE ELECTRON DEVICE LETTERS, VOL. 33, NO. 2, PP. 203-205, 2012
Date:
2011-10-29

Author Information

Name Institution
S. M. SultanUniversity of Southampton
K. SunUniversity of Southampton
O. D. ClarkUniversity of Southampton
T. B. MasaudUniversity of Southampton
Qi FangOxford Instruments
R. GunnOxford Instruments
J. PartridgeUniversity of Canterbury
M. W. AllenUniversity of Canterbury
P. AshburnUniversity of Southampton
H. M. H. ChongUniversity of Southampton

Films

Plasma ZnO



CAS#: 7782-44-7

Film/Plasma Properties

Characteristic: Mobility
Analysis: I-V, Current-Voltage Measurements

Substrates

Notes

645